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1

Advanced mask aligner lithography (AMALITH) for thick photoresist

Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Hennemeyer, Marc, Zoberbier, Ralph, Voigt, Anja, Grützner, Gabi, Ünal, Nezih, Hofmann, Ulrich

Journal:

Microsystem Technologies

Year:

2014

Language:

english

File:

PDF, 435 KB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Lithographic process window optimization for mask aligner proximity lithography

Lai, Kafai, Erdmann, Andreas, Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Erdmann, Andreas, Ünal, Nezih, Hofmann, Ulrich, Hennemeyer, Marc, Zoberbier, Ralph, Nguyen, David, Brugger, Juergen

Year:

2014

Language:

english

File:

PDF, 1.01 MB

english, 2014

3

Advanced mask aligner lithography: new illumination system

Voelkel, Reinhard, Vogler, Uwe, Bich, Andreas, Pernet, Pascal, Weible, Kenneth J., Hornung, Michael, Zoberbier, Ralph, Cullmann, Elmar, Stuerzebecher, Lorenz, Harzendorf, Torsten

Journal:

Year:

2010

Language:

english

File:

PDF, 2.21 MB

english, 2010

4

SPIE Proceedings [SPIE Photonic Devices + Applications - San Diego, CA (Sunday 26 August 2007)] Laser Beam Shaping VIII - Microlens laser beam homogenizer: from theory to application

Zimmermann, Maik, Lindlein, Norbert, Voelkel, Reinhard, Weible, Kenneth J., Dickey, Fred M., Shealy, David L.

Year:

2007

Language:

english

File:

PDF, 1.16 MB

english, 2007

5

Light confinement effect of nonspherical nanoscale solid immersion lenses

Kim, Myun-Sik, Scharf, Toralf, Nguyen, David, Keeler, Ethan, Rydberg, Skyler, Nakagawa, Wataru, Osowiecki, Gaël, Voelkel, Reinhard, Herzig, Hans Peter

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 5.47 MB

english, 2013

6

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Kim, Myun Sik, Naqavi, Ali, Herzig, Hans Peter, Weichelt, Tina, Zeitner, Uwe, Vogler, Uwe, Voelkel, Reinhard

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 6.74 MB

english, 2016

7

Micro-Optics: From High-End to Mass-Market : Wafer-based technology now provides high-quality micro-optics for low-cost consumer products

Reinhard Voelkel

Journal:

Optik & Photonik

Year:

2009

Language:

english

File:

PDF, 276 KB

english, 2009

8

Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners

Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Noell, Wilfried

Journal:

Advanced Optical Technologies

Year:

2015

Language:

english

File:

PDF, 1.90 MB

english, 2015

9

Fabrication and characterization of linear diffusers based on concave micro lens arrays

Bitterli, Roland, Scharf, Toralf, Herzig, Hans-Peter, Noell, Wilfried, de Rooij, Nico, Bich, Andreas, Roth, Sylvain, Weible, Kenneth J., Voelkel, Reinhard, Zimmermann, Maik

Journal:

Year:

2010

Language:

english

File:

PDF, 1.49 MB

english, 2010

10

Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect

Stuerzebecher, Lorenz, Harzendorf, Torsten, Vogler, Uwe, Zeitner, Uwe D., Voelkel, Reinhard

Journal:

Year:

2010

Language:

english

File:

PDF, 1.49 MB

english, 2010

11

[IEEE Nanophotonics - Istanbul, Turkey (2011.08.8-2011.08.11)] 16th International Conference on Optical MEMS and Nanophotonics - Dynamically deformable micromirror array for defined laser beam shaping and homogenizing

Masson, Jonathan, Bitterli, Roland, Noell, Wilfried, de Rooij, Nico F., Bich, Andreas, Weible, Kenneth, Voelkel, Reinhard

Year:

2011

Language:

english

File:

PDF, 835 KB

english, 2011

12

Publisher’s note: Light confinement effect of nonspherical nanoscale solid immersion lenses

Kim, Myun-Sik, Scharf, Toralf, Nguyen, David, Keeler, Ethan, Rydberg, Skyler, Nakagawa, Wataru, Osowiecki, Gaël, Voelkel, Reinhard, Herzig, Hans Peter

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 474 KB

english, 2013

13

SPIE Proceedings [SPIE SPIE Optical Systems Design - Marseille, France (Monday 5 September 2011)] Optical Design and Engineering IV - Simulation tools for advanced mask aligner lithography

Bramati, Arianna, Vogler, Uwe, Meliorisz, Balint, Motzek, Kristian, Hornung, Michael, Voelkel, Reinhard

Year:

2011

Language:

english

File:

PDF, 686 KB

english, 2011

14

Micro-Optics for Photolithography

Voelkel, Reinhard

Journal:

Optik & Photonik

Year:

2015

Language:

english

File:

PDF, 506 KB

english, 2015

15

SPIE Proceedings [SPIE Photonics Asia - Beijing, China (Monday 5 November 2012)] Optical Design and Testing V - Wafer-level micro-optics: trends in manufacturing, testing, packaging, and applications

Voelkel, Reinhard, Gong, Li, Rieck, Juergen, Zheng, Alan, Wang, Yongtian, Du, Chunlei, Hua, Hong, Tatsuno, Kimio, Urbach, H. Paul

Year:

2012

Language:

english

File:

PDF, 949 KB

english, 2012

16

SPIE Proceedings [SPIE SYBEN-Broadband European Networks and Electronic Image Capture and Publishing - Zurich, Switzerland (Monday 18 May 1998)] Advanced Focal Plane Arrays and Electronic Cameras II - Optical microsystems for imaging

Voelkel, Reinhard, Ossmann, Christian, Scharf, Toralf, Herzig, Hans Peter, Daendliker, Rene, Bernard, Thierry M.

Year:

1998

Language:

english

File:

PDF, 3.68 MB

english, 1998

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Advanced mask aligner lithography (AMALITH)

Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Weichelt, Tina, Stuerzebecher, Lorenz, Zeitner, Uwe D., Motzek, Kristian, Erdmann, Andreas, Hornung, Michael, Zoberbier, Ralph, Conley, Will

Year:

2012

Language:

english

File:

PDF, 3.59 MB

english, 2012

18

SPIE Proceedings [SPIE SPIE Optical Systems Design - Marseille, France (Monday 5 September 2011)] Optical Fabrication, Testing, and Metrology IV - Wafer-level micro-optics: trends in manufacturing, testing, and packaging

Voelkel, Reinhard, Duparré, Angela, Geyl, Roland, Weible, Kenneth J., Eisner, Martin

Year:

2011

Language:

english

File:

PDF, 2.69 MB

english, 2011

19

Unified rule based correction for corners in proximity lithography mask using high resolution features

Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Herzig, Hans Peter, Vogler, Uwe, Voelkel, Reinhard

Journal:

Microelectronic Engineering

Year:

2017

Language:

english

File:

PDF, 1.76 MB

english, 2017

20

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Vetter, Andreas, Kirner, Raoul, Opalevs, Dmitrijs, Scholz, Matthias, Leisching, Patrick, Scharf, Toralf, Noell, Wilfried, Rockstuhl, Carsten, Voelkel, Reinhard

Journal:

Year:

2018

File:

PDF, 5.01 MB

2018

21

Flexible beam shaping system using fly’s eye condenser

Lindlein, Norbert, Bich, Andreas, Eisner, Martin, Harder, Irina, Lano, Maik, Voelkel, Reinhard, Weible, Ken, Zimmermann, Maik

Journal:

Year:

2010

Language:

english

File:

PDF, 1.06 MB

english, 2010

22

Two step process for the fabrication of diffraction limited concave microlens arrays

Ruffieux, Patrick, Scharf, Toralf, Philipoussis, Irène, Herzig, Hans Peter, Voelkel, Reinhard, Weible, Kenneth J.

Journal:

Year:

2008

Language:

english

File:

PDF, 1.13 MB

english, 2008

23

SPIE Proceedings [SPIE Optical Systems Design - Glasgow, Scotland, United Kingdom (Monday 1 September 2008)] Optical Fabrication, Testing, and Metrology III - Laser beam homogenizing: limitations and constraints

Voelkel, Reinhard, Weible, Kenneth J., Duparré, Angela, Geyl, Roland

Year:

2008

Language:

english

File:

PDF, 1.66 MB

english, 2008

24

[IEEE Nanophotonics - Sapporo, Japan (2010.08.9-2010.08.12)] 2010 International Conference on Optical MEMS and Nanophotonics - Tunable optical diffusers for high-power laser applications based on magnetically actuated membranes

Masson, Jonathan, Bich, Andreas, Noell, Wilfried, Voelkel, Reinhard, Weible, Kenneth J., de Rooij, Nico F.

Year:

2010

Language:

english

File:

PDF, 1.53 MB

english, 2010

25

Customized illumination for process window optimization and yield improvement in mask aligner lithography systems

Hornung, Michael, Vogler, Uwe, Voelkel, Reinhard

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2010

Language:

english

File:

PDF, 1018 KB

english, 2010

26

SPIE Proceedings [SPIE SPIE Photonics Europe - Brussels, Belgium (Monday 12 April 2010)] Micro-Optics 2010 - Half-tone proximity lithography

Harzendorf, Torsten, Stuerzebecher, Lorenz, Vogler, Uwe, Zeitner, Uwe D., Voelkel, Reinhard, Thienpont, Hugo, Van Daele, Peter, Mohr, Jürgen, Zappe, Hans

Year:

2010

Language:

english

File:

PDF, 1.66 MB

english, 2010

27

SPIE Proceedings [SPIE SPIE OPTO - San Francisco, California, United States (Saturday 7 February 2015)] Practical Holography XXIX: Materials and Applications - Interferometric study on Gouy phase anomaly of microlens array

Bjelkhagen, Hans I., Bove, V. Michael, Kim, Myun-Sik, Scharf, Toralf, Noell, Wilfried, Herzig, Hans Peter, Voelkel, Reinhard

Year:

2015

Language:

english

File:

PDF, 993 KB

english, 2015

28

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 2 February 2013)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI - Low-NA focused vortex beam lithography for below 100-nm feature size at 405 nm illumination

Kim, Myun-Sik, Scharf, Toralf, Herzig, Hans Peter, Voelkel, Reinhard, von Freymann, Georg, Schoenfeld, Winston V., Rumpf, Raymond C.

Year:

2013

Language:

english

File:

PDF, 282 KB

english, 2013

29

SPIE Proceedings [SPIE Lasers, Optics, and Vision for Productivity in Manufacturing I - Besancon, France (Monday 10 June 1996)] Micro-Optical Technologies for Measurement, Sensors, and Microsystems - Micro-optics for sensor applications

Nussbaum, Philippe, Voelkel, Reinhard, Herzig, Hans Peter, Daendliker, Rene, Parriaux, Olivier M.

Year:

1996

Language:

english

File:

PDF, 795 KB

english, 1996

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Intensity and phase fields behind Phase Shifting Masks studied with High Resolution Interference Microscopy

Lai, Kafai, Erdmann, Andreas, Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Herzig, Hans Peter, Weichelt, Tina, Zeitner, Uwe, Vogler, Uwe, Voelkel, Reinhard

Year:

2015

Language:

english

File:

PDF, 890 KB

english, 2015

31

[OSA Frontiers in Optics - Orlando, Florida (2013..-..)] Frontiers in Optics 2013 - Numerical verification of light confinement in a nano solid immersion lens

Kim, Myun-Sik, Nguyen, David, da Costa Assafrao, Alberto, Keeler, Ethan, Rydberg, Skyler, Osowiecki, Gaël, F. Pereira, Silvania, Urbach, H. Paul, Scharf, Toralf, Herzig, Hans Peter, Voelkel, Reinhard,

Year:

2013

Language:

english

File:

PDF, 123 KB

english, 2013

32

SPIE Proceedings [SPIE Micromachining and Microfabrication - San Jose, CA (Saturday 24 January 2004)] MOEMS and Miniaturized Systems IV - Artificial compound eyes: different concepts and their application for ultraflat image acquisition sensors

Duparre, Jacques W., Schreiber, Peter, Dannberg, Peter, Scharf, Toralf, Pelli, Petri, Voelkel, Reinhard, Herzig, Hans-Peter, Braeuer, Andreas, El-Fatatry, Ayman

Year:

2004

Language:

english

File:

PDF, 1.38 MB

english, 2004

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Advanced Mask Aligner Lithography (AMALITH)

Lai, Kafai, Erdmann, Andreas, Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna

Year:

2015

Language:

english

File:

PDF, 1.41 MB

english, 2015

34

SPIE Proceedings [SPIE SPIE Optical Metrology 2013 - Munich, Germany (Monday 13 May 2013)] Optical Measurement Systems for Industrial Inspection VIII - Optical characterization method for very small microlenses (sub-50 micron) for industrial mass-production applications

Kim, Myun-Sik, Lehmann, Peter H., Osten, Wolfgang, Sunarjo, Jonathan, Weible, Kenneth J., Albertazzi, Armando, Voelkel, Reinhard

Year:

2013

Language:

english

File:

PDF, 1.16 MB

english, 2013

35

SPIE Proceedings [SPIE SPIE OPTO - San Francisco, California, United States (Saturday 13 February 2016)] Complex Light and Optical Forces X - Structured amplitude and phase fields behind microstructures: the quest for high contrast modulation at proximity

Glückstad, Jesper, Andrews, David L., Galvez, Enrique J., Scharf, Toralf, Kim, Myun-Sik, Puthankovilakam, Krishnaparvathy, Bernasconi, Johana, Herzig, Hans-Peter, Vogler, Uwe, Voelkel, Reinhard

Year:

2016

Language:

english

File:

PDF, 7.11 MB

english, 2016

36

[IEEE 2015 20th Microoptics Conference (MOC) - Fukuoka, Japan (2015.10.25-2015.10.28)] 2015 20th Microoptics Conference (MOC) - Micro-optics: Key enabling technology for photolithography

Voelkel, Reinhard

Year:

2015

Language:

english

File:

PDF, 223 KB

english, 2015

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Coherence management in lithography printing systems

Erdmann, Andreas, Kye, Jongwook, Bernasconi, Johana, Scharf, Toralf, Herzig, Hans Peter, Voelkel, Reinhard, Bramati, Arianna

Year:

2016

Language:

english

File:

PDF, 2.66 MB

english, 2016

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Phase analysis of amplitude binary mask structures

Erdmann, Andreas, Kye, Jongwook, Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Herzig, Hans Peter, vogler, Uwe, Bramati, Arianna, Voelkel, Reinhard

Year:

2016

Language:

english

File:

PDF, 1.30 MB

english, 2016

39

[IEEE 2015 20th Microoptics Conference (MOC) - Fukuoka, Japan (2015.10.25-2015.10.28)] 2015 20th Microoptics Conference (MOC) - Metrology techniques for refractive microlenses and microlens array manufacturing

Kim, Myun-Sik, Allegre, Lisa, Sunarjo, Jonathan, Noell, Wilfried, Voelkel, Reinhard

Year:

2015

Language:

english

File:

PDF, 400 KB

english, 2015

40

Wafer-scale micro-optics fabrication

Voelkel, Reinhard

Journal:

Advanced Optical Technologies

Year:

2012

Language:

english

File:

PDF, 2.05 MB

english, 2012

41

SPIE Proceedings [SPIE 15th Int'l Optics in Complex Sys. Garmisch, FRG - Garmisch, Federal Republic of Germany (Sunday 5 August 1990)] Optics in Complex Systems - Possibilities and limitations of space-variant holographic optical elements for switching networks and general interconnects

Schwider, Johannes, Stork, Wilhelm, Streibl, Norbert, Voelkel, Reinhard, Lanzl, F., Preuss, H.-J., Weigelt, G.

Year:

1990

Language:

english

File:

PDF, 132 KB

english, 1990

42

SPIE Proceedings [SPIE OE/LASE'93: Optics, Electro-Optics, & Laser Applications in Science& Engineering - Los Angeles, CA (Sunday 17 January 1993)] Optoelectronic Interconnects - Optoelectronic interconnects with holographic optical elements

Voelkel, Reinhard, Heissmeier, M., Kobolla, Harald, Krackhardt, Ulrich W., Rosner, S., Schmidt, Juerg, Schwider, Johannes, Sheridan, John T., Streibl, Norbert, Zobel, F., Chen, Ray T.

Year:

1993

Language:

english

File:

PDF, 597 KB

english, 1993

43

SPIE Proceedings [SPIE Micromachining and Microfabrication - Santa Clara, CA (Monday 18 September 2000)] Micromachining Technology for Micro-Optics - Refractive microlenses for ultraflat photolithographic projection systems

Voelkel, Reinhard, Eisner, Martin, Ossmann, Christian, Weible, Kenneth J., Lee, Sing H., Johnson, Eric G.

Year:

2000

Language:

english

File:

PDF, 800 KB

english, 2000

44

SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, United States (Sunday 17 August 2014)] Interferometry XVII: Techniques and Analysis - Shaping intensity behind amplitude masks for proximity correction lithography: design, measurement, and realization

Creath, Katherine, Burke, Jan, Schmit, Joanna, Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Tan, Qing, Herzig, Hans Peter, Nguyen, David, Vogler, Uwe, Bramati, Arianna, Voelkel, Reinhard

Year:

2014

Language:

english

File:

PDF, 369 KB

english, 2014

45

SPIE Proceedings [SPIE Lasers and Optics in Manufacturing III - Munich, Germany (Monday 16 June 1997)] Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications - Design, fabrication, and testing of micro-optical components for sensors and microsystems

Voelkel, Reinhard, Nussbaum, Philippe, Roulet, Jean-Christophe, Blattner, Peter, Weible, Kenneth J., Herzig, Hans Peter, Parriaux, Olivier M., Kley, Ernst-Bernhard, Culshaw, Brian, Breidne, Magnus

Year:

1997

Language:

english

File:

PDF, 1.48 MB

english, 1997

46

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 2 February 2013)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI - Light confinement effect of non-spherical nanoscale solid immersion lenses

Kim, Myun-Sik, Scharf, Toralf, Nguyen, David, Keeler, Ethan, Rydberg, Skyler, Nakagawa, Wataru, Osowecki, Gaël, Herzig, Hans Peter, Voelkel, Reinhard, von Freymann, Georg, Schoenfeld, Winston V., Rump

Year:

2013

Language:

english

File:

PDF, 891 KB

english, 2013

47

SPIE Proceedings [SPIE SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation - San Diego, CA (Sunday 9 July 1995)] Optical Implementation of Information Processing - Construction of a programmable multilayer analogue neural network using space invariant interconnects

Collings, Neil, Pourzand, Alireza R., Voelkel, Reinhard, Javidi, Bahram, Horner, Joseph L.

Year:

1995

Language:

english

File:

PDF, 715 KB

english, 1995

48

SPIE Proceedings [SPIE 15th Int'l Optics in Complex Sys. Garmisch, FRG - Garmisch, Federal Republic of Germany (Sunday 5 August 1990)] Optics in Complex Systems - Holographic coupling elements for optical bus systems based on a light-guiding optical backplane

Haumann, H.-J., Kobolla, Harald, Sauer, Frank, Schwider, Johannes, Stork, Wilhelm, Streibl, Norbert, Voelkel, Reinhard, Lanzl, F., Preuss, H.-J., Weigelt, G.

Year:

1990

Language:

english

File:

PDF, 96 KB

english, 1990

49

SPIE Proceedings [SPIE SPIE Optical Systems Design - Marseille, France (Monday 5 September 2011)] Illumination Optics II - Mask aligner process enhancement by spatial filtering

Vogler, Uwe, Kidger, Tina E., David, Stuart, Bich, Andreas, Voelkel, Reinhard, Stuerzebecher, Lorenz, Zeitner, Uwe, Hornung, Michael

Year:

2011

Language:

english

File:

PDF, 4.22 MB

english, 2011

50

SPIE Proceedings [SPIE San Diego '92 - San Diego, CA (Sunday 19 July 1992)] Miniature and Micro-Optics: Fabrication and System Applications II - Holographic optical coupling and beamsplitting elements for optoelectronic interconnects and sensors

Schmidt, Juerg, Voelkel, Reinhard, Rosner, S., Stork, Wilhelm, Sheridan, John T., Durst, Franz, Schwider, Johannes, Streibl, Norbert, Roychoudhuri, Chandrasekhar, Veldkamp, Wilfrid B.

Year:

1993

Language:

english

File:

PDF, 594 KB

english, 1993